High-dose Co implantation in Si, SiO2/Si and Si3N4/Si Part III: Heavy-dose Co bombardment induced surface topography development

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High-dose Co implantation in Si, SiO2/Si and Si3N4/Si Part III: Heavy-dose Co bombardment induced surface topography development

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Publication Article, peer reviewed scientific
Title High-dose Co implantation in Si, SiO2/Si and Si3N4/Si Part III: Heavy-dose Co bombardment induced surface topography development
Author(s) Zhang, Y ; Whitlow, Harry J ; Montelius, L ; Graczyk, M ; Sarwe, E-L ; Maximov, I.A ; Zhang, T ; Winzell, T
Date 1999
English abstract
The surface topography development of Si(1 0 0), Si(1 1 1), oxide/Si and nitride/Si structures under high normal fluence (1 x 1016-2.6 x 1018 ions cm-2) keV Co metal vapour vacuum arc (MEVVA) irradiation has been investigated by scanning electron microscopy (SEM). The results show that for normal fluences up to ~1017 ions cm-2, the surface topography remains flat. As the fluence increases, pores develop and grow to form a columnar structure. At even higher fluences the columns are eroded to form an acicular structure. Deposition of a silicon dioxide or nitride layer on the Si surface leads to a significant suppression of the onset fluence for the formation of a rough surface. The porous surface could not be transformed to the network of acicular structures or a flat surface by high temperature annealing.
Host/Issue Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;3
Volume 159
ISSN 0168-583X
Pages 158-165
Language eng (iso)
Subject(s) Surface topography
Nitride
Oxide
Silicon
Scanning electron microscopy (SEM)
Sputtering
Handle http://hdl.handle.net/2043/586 (link to this page)
Link http://dx.doi.org/10.1016/S0168-583X(99)00539-X (external link to related web page)

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